Ranging from the basic principles to the forefront of microlithography, this unique volume explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology Reviewing the interaction of light, electron beams, and X-rays with resist materials, Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology explains the theoretical basis of semiconductor fabrication presents the principles of optical image transfer discusses the chemical amplification of resist materials to improve sensitivity describes resolution enhancement and the limits of resolution in resist materials investigates contrast enhancement materials, multilayer resist, and dry development processes introduces a rigorous solution of two-dimensional light wave diffraction for the first time covers practical aspects of typical lithographic processes and more Featuring over 800 references, tables, drawings, photographs, and equations, Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology is ideal for physicists; lithographic, electrical, optical, semiconductor, integrated circuit process, chemical, and process equipment engineers; resist and polymer chemists and photochemists; materials scientists; and upper-level undergraduate and graduate students in these disciplines.